Comparative study between the electrochemical behavior of TiN, TiCxNy and CrN hard coatings by using microscopy and electrochemical techniques

Comparative study between the electrochemical behavior of TiN, TiCxNy and CrN hard coatings by using microscopy and electrochemical techniques

Hard thin TiN, TiCxNy and CrN films deposited by Physical Vapor Deposition (PVD) techniques onto steel substrates were immersed in an aggressive environment and evaluated by Atomic Force Microscopy (AFM) and Electrochemical Impedance Spectroscopy (EIS). The mechanical and electrochemical behavior, a...

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Bibliographic Details
Main Authors: L.F. Senna, C.A. Achete, R.A. Simão, T. Hirsch
Format: Article
Language:English
Published: Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol) 2001-01-01
Series:Materials Research
Subjects:
atomic force microscopy (AFM)
electrochemical impedance spectroscopy (EIS)
hard coatings
Online Access:http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392001000200017

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http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392001000200017

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