Determination of precise crystallographic directions on Si{111} wafers using self-aligning pre-etched pattern
Abstract Silicon wet anisotropic etching based bulk micromachining technique is widely used for the fabrication of microelectromechanical systems components. In this technique of microfabrication, alignment of mask edges with crystallographic directions plays a crucial role to avoid unwanted undercu...
Main Authors: | , , , |
---|---|
Format: | Article |
Language: | English |
Published: |
SpringerOpen
2018-06-01
|
Series: | Micro and Nano Systems Letters |
Subjects: | |
Online Access: | http://link.springer.com/article/10.1186/s40486-018-0066-1 |