Determination of precise crystallographic directions on Si{111} wafers using self-aligning pre-etched pattern

Abstract Silicon wet anisotropic etching based bulk micromachining technique is widely used for the fabrication of microelectromechanical systems components. In this technique of microfabrication, alignment of mask edges with crystallographic directions plays a crucial role to avoid unwanted undercu...

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Bibliographic Details
Main Authors: Avvaru Venkata Narasimha Rao, Veerla Swarnalatha, Ashok Kumar Pandey, Prem Pal
Format: Article
Language:English
Published: SpringerOpen 2018-06-01
Series:Micro and Nano Systems Letters
Subjects:
Online Access:http://link.springer.com/article/10.1186/s40486-018-0066-1