Helium ion microscopy for low-damage characterization and sub-10 nm nanofabrication

Abstract This review introduces the technique of helium ion microscopy along with some unique applications of this technology in the fields of electronics and biology, as performed at the National Institute of Advanced Industrial Science and Technology, Japan, over the last several years. Observatio...

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Bibliographic Details
Main Author: Shinichi Ogawa
Format: Article
Language:English
Published: Springer 2022-07-01
Series:AAPPS Bulletin
Subjects:
Online Access:https://doi.org/10.1007/s43673-022-00050-7