Fixed Abrasive Polishing in an Anhydrous Environment: A Material Removal Model for Fused Silica
Due to the prevalent randomness and uncertainties associated with traditional loose polishing, fixed abrasive polishing in an anhydrous environment has been chosen as a new polishing method. In this paper, cerium oxide is the main component for polishing pellets, and the particle size distribution o...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2022-02-01
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| Series: | Machines |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2075-1702/10/2/147 |