Fixed Abrasive Polishing in an Anhydrous Environment: A Material Removal Model for Fused Silica

Fixed Abrasive Polishing in an Anhydrous Environment: A Material Removal Model for Fused Silica

Due to the prevalent randomness and uncertainties associated with traditional loose polishing, fixed abrasive polishing in an anhydrous environment has been chosen as a new polishing method. In this paper, cerium oxide is the main component for polishing pellets, and the particle size distribution o...

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Bibliographic Details
Main Authors:	Yuan Qian, Wei Yang, Chaoxu Chen, Xiaoluo Yu
Format:	Article
Language:	English
Published:	MDPI AG 2022-02-01
Series:	Machines
Subjects:	fixed abrasive polishing anhydrous fused silica Monte Carlo simulation
Online Access:	https://www.mdpi.com/2075-1702/10/2/147

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