On the Properties of the Si-SiO2 Transition Layer in Multilayer Silicon Structures

Capacitance spectroscopy was used to study the capacitive-voltage characteristics of multilayer structures with a Si-SiO2 transition layer in Al-SiO2-n-Si type samples fabricated by the thermal oxidation of a semiconductor. It is shown that the inhomogeneous distribution of the density of surface s...

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Main Authors: Shakhrukh Kh. Daliev, Fayzulla A. Saparov
Format: Article
Language:English
Published: V.N. Karazin Kharkiv National University Publishing 2023-12-01
Series:East European Journal of Physics
Subjects:
Online Access:https://periodicals.karazin.ua/eejp/article/view/22077
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author Shakhrukh Kh. Daliev
Fayzulla A. Saparov
author_facet Shakhrukh Kh. Daliev
Fayzulla A. Saparov
author_sort Shakhrukh Kh. Daliev
collection DOAJ
description Capacitance spectroscopy was used to study the capacitive-voltage characteristics of multilayer structures with a Si-SiO2 transition layer in Al-SiO2-n-Si type samples fabricated by the thermal oxidation of a semiconductor. It is shown that the inhomogeneous distribution of the density of surface states is a localized electroactive center at the very semiconductor-dielectric interface, due to over-barrier charge emission or thermal ionization of impurity centers.
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spelling doaj.art-4728e76379fd446d9603a82d65bbdf9a2023-12-02T13:52:25ZengV.N. Karazin Kharkiv National University PublishingEast European Journal of Physics2312-43342312-45392023-12-01410.26565/2312-4334-2023-4-25On the Properties of the Si-SiO2 Transition Layer in Multilayer Silicon StructuresShakhrukh Kh. Daliev0Fayzulla A. Saparov1Institute of Semiconductor Physics and Microelectronics at the National University of Uzbekistan, Tashkent, UzbekistanInstitute of Semiconductor Physics and Microelectronics at the National University of Uzbekistan, Tashkent, Uzbekistan Capacitance spectroscopy was used to study the capacitive-voltage characteristics of multilayer structures with a Si-SiO2 transition layer in Al-SiO2-n-Si type samples fabricated by the thermal oxidation of a semiconductor. It is shown that the inhomogeneous distribution of the density of surface states is a localized electroactive center at the very semiconductor-dielectric interface, due to over-barrier charge emission or thermal ionization of impurity centers. https://periodicals.karazin.ua/eejp/article/view/22077MDS structuresilicontransition layerinterface, temperaturedielectric layer
spellingShingle Shakhrukh Kh. Daliev
Fayzulla A. Saparov
On the Properties of the Si-SiO2 Transition Layer in Multilayer Silicon Structures
East European Journal of Physics
MDS structure
silicon
transition layer
interface
, temperature
dielectric layer
title On the Properties of the Si-SiO2 Transition Layer in Multilayer Silicon Structures
title_full On the Properties of the Si-SiO2 Transition Layer in Multilayer Silicon Structures
title_fullStr On the Properties of the Si-SiO2 Transition Layer in Multilayer Silicon Structures
title_full_unstemmed On the Properties of the Si-SiO2 Transition Layer in Multilayer Silicon Structures
title_short On the Properties of the Si-SiO2 Transition Layer in Multilayer Silicon Structures
title_sort on the properties of the si sio2 transition layer in multilayer silicon structures
topic MDS structure
silicon
transition layer
interface
, temperature
dielectric layer
url https://periodicals.karazin.ua/eejp/article/view/22077
work_keys_str_mv AT shakhrukhkhdaliev onthepropertiesofthesisio2transitionlayerinmultilayersiliconstructures
AT fayzullaasaparov onthepropertiesofthesisio2transitionlayerinmultilayersiliconstructures