A Model-Based Approach for Measuring Wavefront Aberrations Using Random Ball Residual Compensation
The projection objective lens holds a pivotal role in lithography, directly influencing imaging system quality and, consequently, the lithography machine’s feature dimensions. Optical inspection methods for this lens require advancements in calibrating systematic error and enhancing alignment precis...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2023-09-01
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| Series: | Photonics |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2304-6732/10/10/1083 |