Experimental Strategies for Studying Tribo-Electrochemical Aspects of Chemical–Mechanical Planarization

Experimental Strategies for Studying Tribo-Electrochemical Aspects of Chemical–Mechanical Planarization

Chemical–mechanical planarization (CMP) is used to smoothen the topographies of a rough surface by combining several functions of tribology (friction, lubrication), chemistry, and electrochemistry (corrosion, wear, tribo-corrosion). The surface layer of interest is structurally weakened by the chemi...

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Bibliographic Details
Main Authors: Kassapa Gamagedara, Dipankar Roy
Format: Article
Language:English
Published: MDPI AG 2024-02-01
Series:Lubricants
Subjects:
chemical–mechanical planarization
mixed-boundary lubrication
electrolyte lubricant
tribo-corrosion
tribo-film
tribo-electrochemistry
Online Access:https://www.mdpi.com/2075-4442/12/2/63

Internet

https://www.mdpi.com/2075-4442/12/2/63

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