Characteristics of TiN Thin Films Deposited by Substrate Temperature Variables Using Scanning Acoustic Microscopy
In this study, TiN thin films fabricated based on the substrate temperature process parameters of a DC magnetron sputtering device and their characteristics are analyzed. TiN thin films are deposited on Si wafer (100) substrates by setting the substrate temperatures to ambient temperature, 100, 200,...
Main Authors: | , , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2022-03-01
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Series: | Applied Sciences |
Subjects: | |
Online Access: | https://www.mdpi.com/2076-3417/12/7/3571 |