Characteristics of TiN Thin Films Deposited by Substrate Temperature Variables Using Scanning Acoustic Microscopy

In this study, TiN thin films fabricated based on the substrate temperature process parameters of a DC magnetron sputtering device and their characteristics are analyzed. TiN thin films are deposited on Si wafer (100) substrates by setting the substrate temperatures to ambient temperature, 100, 200,...

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Bibliographic Details
Main Authors: Dongchan Kang, Young Sung Kim, Jeong Nyeon Kim, Ik Keun Park
Format: Article
Language:English
Published: MDPI AG 2022-03-01
Series:Applied Sciences
Subjects:
Online Access:https://www.mdpi.com/2076-3417/12/7/3571