Patterning Techniques for Fabrication of Submicrometer Structures in Photoresist, III-V Semiconductors and PMMA

Patterning Techniques for Fabrication of Submicrometer Structures in Photoresist, III-V Semiconductors and PMMA

This paper presents experimental results in the field of planar periodic structures, their fabrication and analysis. We demonstrate techniques and experimental results of fabrication of two-dimensional periodic structures and their preparation in a thin photoresist layer, III-V semiconductors and PM...

Full description

Bibliographic Details
Main Authors: Dusan Pudis, Jarmila Kubicova, Lubos Suslik, Jaroslava Skriniarova, Ivan Martincek, Ivan Novotny
Format: Article
Language:English
Published: University of Žilina 2010-06-01
Series:Communications
Subjects:
no keywords
Online Access:https://komunikacie.uniza.sk/artkey/csl-201002-0011_patterning-techniques-for-fabrication-of-submicrometer-structures-in-photoresist-iii-v-semiconductors-and-pmma.php

Internet

https://komunikacie.uniza.sk/artkey/csl-201002-0011_patterning-techniques-for-fabrication-of-submicrometer-structures-in-photoresist-iii-v-semiconductors-and-pmma.php

Similar Items