Plasma Assisted Chemical Vapour Deposition – Technological Design Of Functional Coatings

Plasma Assisted Chemical Vapour Deposition – Technological Design Of Functional Coatings

Plasma Assisted Chemical Vapour Deposition (PA CVD) method allows to deposit of homogeneous, well-adhesive coatings at lower temperature on different substrates. Plasmochemical treatment significantly impacts on physicochemical parameters of modified surfaces. In this study we present the overview o...

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Bibliographic Details
Main Authors: Januś M., Kyzioł K., Kluska S., Konefał-Góral J., Małek A., Jonas S.
Format: Article
Language:English
Published: Polish Academy of Sciences 2015-06-01
Series:Archives of Metallurgy and Materials
Subjects:
PA CVD
titanium
aluminum alloys
polyetheretherketone
ceramic coatings
Online Access:http://www.degruyter.com/view/j/amm.2015.60.issue-2/amm-2015-0228/amm-2015-0228.xml?format=INT

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