Heteroepitaxy Growth and Characterization of High-Quality AlN Films for Far-Ultraviolet Photodetection

The ultra-wide bandgap (~6.2 eV), thermal stability and radiation tolerance of AlN make it an ideal choice for preparation of high-performance far-ultraviolet photodetectors (FUV PDs). However, the challenge of epitaxial crack-free AlN single-crystalline films (SCFs) on GaN templates with low defect...

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Bibliographic Details
Main Authors: Titao Li, Yaoping Lu, Zuxin Chen
Format: Article
Language:English
Published: MDPI AG 2022-11-01
Series:Nanomaterials
Subjects:
Online Access:https://www.mdpi.com/2079-4991/12/23/4169