Accelerated carrier recombination by grain boundary/edge defects in MBE grown transition metal dichalcogenides

Defect-carrier interaction in transition metal dichalcogenides (TMDs) plays important roles in carrier relaxation dynamics and carrier transport, which determines the performance of electronic devices. With femtosecond laser time-resolved spectroscopy, we investigated t...

Full description

Bibliographic Details
Main Authors: Ke Chen, Anupam Roy, Amritesh Rai, Hema C. P. Movva, Xianghai Meng, Feng He, Sanjay K. Banerjee, Yaguo Wang
Format: Article
Language:English
Published: AIP Publishing LLC 2018-05-01
Series:APL Materials
Online Access:http://dx.doi.org/10.1063/1.5022339
_version_ 1819039069222469632
author Ke Chen
Anupam Roy
Amritesh Rai
Hema C. P. Movva
Xianghai Meng
Feng He
Sanjay K. Banerjee
Yaguo Wang
author_facet Ke Chen
Anupam Roy
Amritesh Rai
Hema C. P. Movva
Xianghai Meng
Feng He
Sanjay K. Banerjee
Yaguo Wang
author_sort Ke Chen
collection DOAJ
description Defect-carrier interaction in transition metal dichalcogenides (TMDs) plays important roles in carrier relaxation dynamics and carrier transport, which determines the performance of electronic devices. With femtosecond laser time-resolved spectroscopy, we investigated the effect of grain boundary/edge defects on the ultrafast dynamics of photoexcited carrier in molecular beam epitaxy (MBE)-grown MoTe2 and MoSe2. We found that, comparing with exfoliated samples, the carrier recombination rate in MBE-grown samples accelerates by about 50 times. We attribute this striking difference to the existence of abundant grain boundary/edge defects in MBE-grown samples, which can serve as effective recombination centers for the photoexcited carriers. We also observed coherent acoustic phonons in both exfoliated and MBE-grown MoTe2, indicating strong electron-phonon coupling in this materials. Our measured sound velocity agrees well with the previously reported result of theoretical calculation. Our findings provide a useful reference for the fundamental parameters: carrier lifetime and sound velocity and reveal the undiscovered carrier recombination effect of grain boundary/edge defects, both of which will facilitate the defect engineering in TMD materials for high speed opto-electronics.
first_indexed 2024-12-21T08:47:20Z
format Article
id doaj.art-4e2980ed91d34ab6a1b2458bd009df0c
institution Directory Open Access Journal
issn 2166-532X
language English
last_indexed 2024-12-21T08:47:20Z
publishDate 2018-05-01
publisher AIP Publishing LLC
record_format Article
series APL Materials
spelling doaj.art-4e2980ed91d34ab6a1b2458bd009df0c2022-12-21T19:09:48ZengAIP Publishing LLCAPL Materials2166-532X2018-05-0165056103056103-710.1063/1.5022339004805APMAccelerated carrier recombination by grain boundary/edge defects in MBE grown transition metal dichalcogenidesKe Chen0Anupam Roy1Amritesh Rai2Hema C. P. Movva3Xianghai Meng4Feng He5Sanjay K. Banerjee6Yaguo Wang7Department of Mechanical Engineering, The University of Texas at Austin, Austin, Texas 78712, USAMicroelectronics Research Center and Department of Electrical and Computer Engineering, The University of Texas at Austin, Austin, Texas 78758, USAMicroelectronics Research Center and Department of Electrical and Computer Engineering, The University of Texas at Austin, Austin, Texas 78758, USAMicroelectronics Research Center and Department of Electrical and Computer Engineering, The University of Texas at Austin, Austin, Texas 78758, USADepartment of Mechanical Engineering, The University of Texas at Austin, Austin, Texas 78712, USADepartment of Mechanical Engineering, The University of Texas at Austin, Austin, Texas 78712, USAMicroelectronics Research Center and Department of Electrical and Computer Engineering, The University of Texas at Austin, Austin, Texas 78758, USADepartment of Mechanical Engineering, The University of Texas at Austin, Austin, Texas 78712, USADefect-carrier interaction in transition metal dichalcogenides (TMDs) plays important roles in carrier relaxation dynamics and carrier transport, which determines the performance of electronic devices. With femtosecond laser time-resolved spectroscopy, we investigated the effect of grain boundary/edge defects on the ultrafast dynamics of photoexcited carrier in molecular beam epitaxy (MBE)-grown MoTe2 and MoSe2. We found that, comparing with exfoliated samples, the carrier recombination rate in MBE-grown samples accelerates by about 50 times. We attribute this striking difference to the existence of abundant grain boundary/edge defects in MBE-grown samples, which can serve as effective recombination centers for the photoexcited carriers. We also observed coherent acoustic phonons in both exfoliated and MBE-grown MoTe2, indicating strong electron-phonon coupling in this materials. Our measured sound velocity agrees well with the previously reported result of theoretical calculation. Our findings provide a useful reference for the fundamental parameters: carrier lifetime and sound velocity and reveal the undiscovered carrier recombination effect of grain boundary/edge defects, both of which will facilitate the defect engineering in TMD materials for high speed opto-electronics.http://dx.doi.org/10.1063/1.5022339
spellingShingle Ke Chen
Anupam Roy
Amritesh Rai
Hema C. P. Movva
Xianghai Meng
Feng He
Sanjay K. Banerjee
Yaguo Wang
Accelerated carrier recombination by grain boundary/edge defects in MBE grown transition metal dichalcogenides
APL Materials
title Accelerated carrier recombination by grain boundary/edge defects in MBE grown transition metal dichalcogenides
title_full Accelerated carrier recombination by grain boundary/edge defects in MBE grown transition metal dichalcogenides
title_fullStr Accelerated carrier recombination by grain boundary/edge defects in MBE grown transition metal dichalcogenides
title_full_unstemmed Accelerated carrier recombination by grain boundary/edge defects in MBE grown transition metal dichalcogenides
title_short Accelerated carrier recombination by grain boundary/edge defects in MBE grown transition metal dichalcogenides
title_sort accelerated carrier recombination by grain boundary edge defects in mbe grown transition metal dichalcogenides
url http://dx.doi.org/10.1063/1.5022339
work_keys_str_mv AT kechen acceleratedcarrierrecombinationbygrainboundaryedgedefectsinmbegrowntransitionmetaldichalcogenides
AT anupamroy acceleratedcarrierrecombinationbygrainboundaryedgedefectsinmbegrowntransitionmetaldichalcogenides
AT amriteshrai acceleratedcarrierrecombinationbygrainboundaryedgedefectsinmbegrowntransitionmetaldichalcogenides
AT hemacpmovva acceleratedcarrierrecombinationbygrainboundaryedgedefectsinmbegrowntransitionmetaldichalcogenides
AT xianghaimeng acceleratedcarrierrecombinationbygrainboundaryedgedefectsinmbegrowntransitionmetaldichalcogenides
AT fenghe acceleratedcarrierrecombinationbygrainboundaryedgedefectsinmbegrowntransitionmetaldichalcogenides
AT sanjaykbanerjee acceleratedcarrierrecombinationbygrainboundaryedgedefectsinmbegrowntransitionmetaldichalcogenides
AT yaguowang acceleratedcarrierrecombinationbygrainboundaryedgedefectsinmbegrowntransitionmetaldichalcogenides