Synthesis of Atomically Thin h-BN Layers Using BCl<sub>3</sub> and NH<sub>3</sub> by Sequential-Pulsed Chemical Vapor Deposition on Cu Foil

Synthesis of Atomically Thin h-BN Layers Using BCl<sub>3</sub> and NH<sub>3</sub> by Sequential-Pulsed Chemical Vapor Deposition on Cu Foil

The chemical vapor deposition of hexagonal boron nitride layers from BCl<sub>3</sub> and NH<sub>3</sub> is highly beneficial for scalable synthesis with high controllability, yet multiple challenges such as corrosive reaction or by-product formation have hindered its successf...

Full description

Bibliographic Details
Main Authors: Hongseok Oh, Gyu-Chul Yi
Format: Article
Language:English
Published: MDPI AG 2021-12-01
Series:Nanomaterials
Subjects:
h-BN
BCl<sub>3</sub>
NH<sub>3</sub>
sequential-pulsed CVD
Online Access:https://www.mdpi.com/2079-4991/12/1/80

Internet

https://www.mdpi.com/2079-4991/12/1/80

Similar Items