Structure and properties of Ta doped TiN films prepared using different sputtering powers for Ta target

Structure and properties of Ta doped TiN films prepared using different sputtering powers for Ta target

Ta doped TiN films were prepared on glass substrates by DC magnetron co-sputtering. The structure and properties of the obtained (Ti,Ta)N film were characterized by X-ray diffraction, Raman spectroscopy, ultraviolet/visible/near-infrared spectrophotometer and four probes method. The results show tha...

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Bibliographic Details
Main Authors: Wang Yuemeng, Shi Xinwei, Liu Miaomiao, Yang Yifan, Gao Qilong, Zhu Bailin, Xu Liujie
Format: Article
Language:English
Published: University of Novi Sad 2022-09-01
Series:Processing and Application of Ceramics
Subjects:
co-sputtering
low-emission films
raman spectroscopy
(tita)n film
Online Access:http://www.doiserbia.nb.rs/img/doi/1820-6131/2022/1820-61312203191W.pdf

Internet

http://www.doiserbia.nb.rs/img/doi/1820-6131/2022/1820-61312203191W.pdf

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