Reliability Improvement from La2O3 Interfaces in Hf0.5Zr0.5O2‐Based Ferroelectric Capacitors

Reliability Improvement from La2O3 Interfaces in Hf0.5Zr0.5O2‐Based Ferroelectric Capacitors

Abstract Further optimization of a typically reported ferroelectric capacitor comprised of a Hf0.5Zr0.5O2 ferroelectric thin film with TiN electrodes is explored by introducing an additional non‐ferroelectric La2O3 interfacial layer evaluated at different positions in the capacitor stack. The role o...

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Bibliographic Details
Main Authors: Furqan Mehmood, Ruben Alcala, Pramoda Vishnumurthy, Bohan Xu, Ridham Sachdeva, Thomas Mikolajick, Uwe Schroeder
Format: Article
Language:English
Published: Wiley-VCH 2023-03-01
Series:Advanced Materials Interfaces
Subjects:
endurance
ferroelectric
Hf 0.5Zr 0.5O 2
interface
La 2O 3
reliability
Online Access:https://doi.org/10.1002/admi.202202151

Internet

https://doi.org/10.1002/admi.202202151

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