Machine Learning Techniques and Systems for Mask-Face Detection—Survey and a New OOD-Mask Approach

Mask-face detection has been a significant task since the outbreak of the COVID-19 pandemic in early 2020. While various reviews on mask-face detection techniques up to 2021 are available, little has been reviewed on the distinction between two-class (i.e., wearing mask and without mask) and three-c...

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Bibliographic Details
Main Authors: Youwen Hu, Yicheng Xu, Huiping Zhuang, Zhenyu Weng, Zhiping Lin
Format: Article
Language:English
Published: MDPI AG 2022-09-01
Series:Applied Sciences
Subjects:
Online Access:https://www.mdpi.com/2076-3417/12/18/9171