Chemical Composition of Gas and Particle Phase Products of Toluene Photooxidation Reaction under High OH Exposure Condition

Chemical Composition of Gas and Particle Phase Products of Toluene Photooxidation Reaction under High OH Exposure Condition

In the current study, the photooxidation reaction of toluene (C<sub>7</sub>H<sub>8</sub>) was investigated in a Potential Aerosol Mass Oxidation Flow Reactor (PAM OFR). The hydroxyl radical (OH) exposure of toluene in the PAM OFR ranged from 0.4 to 1.4 × 10<sup>12</s...

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Bibliographic Details
Main Authors: Yik-Sze Lau, Man-Nin Chan, Hon-Yin Poon, Yan Tan, Shun-Cheng Lee, Jianjun Li, Kin-Fai Ho
Format: Article
Language:English
Published: MDPI AG 2021-07-01
Series:Atmosphere
Subjects:
Potential Aerosol Mass (PAM)
toluene
PTR-MS
photooxidation
ageing
Online Access:https://www.mdpi.com/2073-4433/12/7/915

Internet

https://www.mdpi.com/2073-4433/12/7/915

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