Recent Advances in Theoretical Development of Thermal Atomic Layer Deposition: A Review

Recent Advances in Theoretical Development of Thermal Atomic Layer Deposition: A Review

Atomic layer deposition (ALD) is a vapor-phase deposition technique that has attracted increasing attention from both experimentalists and theoreticians in the last few decades. ALD is well-known to produce conformal, uniform, and pinhole-free thin films across the surface of substrates. Due to thes...

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Bibliographic Details
Main Authors: Mina Shahmohammadi, Rajib Mukherjee, Cortino Sukotjo, Urmila M. Diwekar, Christos G. Takoudis
Format: Article
Language:English
Published: MDPI AG 2022-03-01
Series:Nanomaterials
Subjects:
atomic layer deposition (ALD)
precursors
mechanisms
deposition characteristics density functional theory
molecular dynamics
lattice Boltzmann method
Online Access:https://www.mdpi.com/2079-4991/12/5/831

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https://www.mdpi.com/2079-4991/12/5/831

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