The thermal stability and degradation mechanism of Cu/Mo nanomultilayers

The microstructural evolution of Cu/Mo nanomultilayers upon annealing was investigated by X-ray diffraction and transmission electron microscopy. The isothermal annealing process in the temperature ranges of 300–850°C was conducted to understand the thermal behavior of the sample and follow the tran...

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Bibliographic Details
Main Authors: Jeyun Yeom, Giacomo Lorenzin, Lea Ghisalberti, Claudia Cancellieri, Jolanta Janczak-Rusch
Format: Article
Language:English
Published: Taylor & Francis Group 2024-12-01
Series:Science and Technology of Advanced Materials
Subjects:
Online Access:https://www.tandfonline.com/doi/10.1080/14686996.2024.2357536