Fabrication of a Polymer High-Aspect-Ratio Pillar Array Using UV Imprinting

Fabrication of a Polymer High-Aspect-Ratio Pillar Array Using UV Imprinting

This paper presents UV imprinting methods for fabricating a high-aspect-ratio pillar array. A polydimethylsiloxane (PDMS) mold was selected as the UV imprinting mold. The pillar pattern was formed on a 50 × 50 mm2 area on a polyethylene terephthalate (PET) film without remarkable deformation. The as...

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Bibliographic Details
Main Authors: Jun Mizuno, Takashi Kasahara, Hidetoshi Shinohara, Hiroshi Goto
Format: Article
Language:English
Published: MDPI AG 2013-04-01
Series:Micromachines
Subjects:
high-aspect-ratio
UV imprinting
resin mold
polydimethylsiloxane
Online Access:http://www.mdpi.com/2072-666X/4/2/157

Internet

http://www.mdpi.com/2072-666X/4/2/157

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