Silicon oxide film formation by spraying tetraethyl orthosilicate onto substrate with simultaneous low-energy SiO+ ion-beam irradiation
We attempted to deposit silicon oxide films by spraying tetraethyl orthosilicate (TEOS) onto a substrate while the substrate was also irradiated with a low-energy SiO+ ion beam. The energy of the SiO+ ions was 55 eV, and the substrate temperature was 300 °C. Following this process, we were able to d...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2023-11-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/5.0172701 |