Studi Optimasi Parameter Daya RF untuk Penumbuhan Lapisan Tipis Mikrokristal Silikon dengan Metode Hot Wire Cell PECVD
The Hot Wire Cell PECVD method has been developed and successfully applied to grow the hydrogenated amorphous silicon (a-Si:H) thin films with a relatively high conductivity. The a-Si:H thin films were grown on the 7059 corning glass at a filament temperature of 800 oC. Ten percents silane (SiH4) g...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
ITB Journal Publisher
2013-12-01
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| Series: | Journal of Mathematical and Fundamental Sciences |
| Online Access: | https://journals.itb.ac.id/index.php/jmfs/article/view/282 |