A practical perspective for chromatic orthogonality for implementing in photolithography

Abstract Theoretically, it is more challenging to anticipate the conversion and selectivity of a photochemical experiment compared to thermally generated reactivity. This is due to the interaction of light with a photoreactive substrate. Photochemical reactions do not yet receive the same level of b...

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Main Authors: Godlaveeti Sreenivasa Kumar, Mizaj Shabil Sha, Swathi Yempally, John-John Cabibihan, Kishor Kumar Sadasivuni
Format: Article
Language:English
Published: Nature Portfolio 2023-01-01
Series:Scientific Reports
Online Access:https://doi.org/10.1038/s41598-023-27869-w
_version_ 1797952546171518976
author Godlaveeti Sreenivasa Kumar
Mizaj Shabil Sha
Swathi Yempally
John-John Cabibihan
Kishor Kumar Sadasivuni
author_facet Godlaveeti Sreenivasa Kumar
Mizaj Shabil Sha
Swathi Yempally
John-John Cabibihan
Kishor Kumar Sadasivuni
author_sort Godlaveeti Sreenivasa Kumar
collection DOAJ
description Abstract Theoretically, it is more challenging to anticipate the conversion and selectivity of a photochemical experiment compared to thermally generated reactivity. This is due to the interaction of light with a photoreactive substrate. Photochemical reactions do not yet receive the same level of broad analytical study. Here, we close this research gap by presenting a methodology for statistically forecasting the time-dependent progression of photoreactions using widely available LEDs. This study uses NiS/ZnO in perovskite (MAPbI3) solar cells as an additive (5 volume %). The effect of monolithic perovskite solar cells (mPSCs) on forecasting the wavelength of LEDs has been carefully investigated using various characterization methods, including X-ray diffraction (XRD) and Transmission electron microscopy (TEM). The photocatalytic activity was analyzed by measuring the voltage produced. Various factors like selectivity, stability and sensitivity were also examined. This work provides a new perspective to validate NiS/ZnO photocatalysts for predicting the wavelength of different light sources and to apply in photolithography.
first_indexed 2024-04-10T22:49:17Z
format Article
id doaj.art-56208ecaf9944e1fab051aee13400b52
institution Directory Open Access Journal
issn 2045-2322
language English
last_indexed 2024-04-10T22:49:17Z
publishDate 2023-01-01
publisher Nature Portfolio
record_format Article
series Scientific Reports
spelling doaj.art-56208ecaf9944e1fab051aee13400b522023-01-15T12:09:14ZengNature PortfolioScientific Reports2045-23222023-01-011311710.1038/s41598-023-27869-wA practical perspective for chromatic orthogonality for implementing in photolithographyGodlaveeti Sreenivasa Kumar0Mizaj Shabil Sha1Swathi Yempally2John-John Cabibihan3Kishor Kumar Sadasivuni4Center for Advanced Materials, Qatar UniversityCenter for Advanced Materials, Qatar UniversityCenter for Advanced Materials, Qatar UniversityDepartment of Mechanical and Industrial Engineering, Qatar UniversityCenter for Advanced Materials, Qatar UniversityAbstract Theoretically, it is more challenging to anticipate the conversion and selectivity of a photochemical experiment compared to thermally generated reactivity. This is due to the interaction of light with a photoreactive substrate. Photochemical reactions do not yet receive the same level of broad analytical study. Here, we close this research gap by presenting a methodology for statistically forecasting the time-dependent progression of photoreactions using widely available LEDs. This study uses NiS/ZnO in perovskite (MAPbI3) solar cells as an additive (5 volume %). The effect of monolithic perovskite solar cells (mPSCs) on forecasting the wavelength of LEDs has been carefully investigated using various characterization methods, including X-ray diffraction (XRD) and Transmission electron microscopy (TEM). The photocatalytic activity was analyzed by measuring the voltage produced. Various factors like selectivity, stability and sensitivity were also examined. This work provides a new perspective to validate NiS/ZnO photocatalysts for predicting the wavelength of different light sources and to apply in photolithography.https://doi.org/10.1038/s41598-023-27869-w
spellingShingle Godlaveeti Sreenivasa Kumar
Mizaj Shabil Sha
Swathi Yempally
John-John Cabibihan
Kishor Kumar Sadasivuni
A practical perspective for chromatic orthogonality for implementing in photolithography
Scientific Reports
title A practical perspective for chromatic orthogonality for implementing in photolithography
title_full A practical perspective for chromatic orthogonality for implementing in photolithography
title_fullStr A practical perspective for chromatic orthogonality for implementing in photolithography
title_full_unstemmed A practical perspective for chromatic orthogonality for implementing in photolithography
title_short A practical perspective for chromatic orthogonality for implementing in photolithography
title_sort practical perspective for chromatic orthogonality for implementing in photolithography
url https://doi.org/10.1038/s41598-023-27869-w
work_keys_str_mv AT godlaveetisreenivasakumar apracticalperspectiveforchromaticorthogonalityforimplementinginphotolithography
AT mizajshabilsha apracticalperspectiveforchromaticorthogonalityforimplementinginphotolithography
AT swathiyempally apracticalperspectiveforchromaticorthogonalityforimplementinginphotolithography
AT johnjohncabibihan apracticalperspectiveforchromaticorthogonalityforimplementinginphotolithography
AT kishorkumarsadasivuni apracticalperspectiveforchromaticorthogonalityforimplementinginphotolithography
AT godlaveetisreenivasakumar practicalperspectiveforchromaticorthogonalityforimplementinginphotolithography
AT mizajshabilsha practicalperspectiveforchromaticorthogonalityforimplementinginphotolithography
AT swathiyempally practicalperspectiveforchromaticorthogonalityforimplementinginphotolithography
AT johnjohncabibihan practicalperspectiveforchromaticorthogonalityforimplementinginphotolithography
AT kishorkumarsadasivuni practicalperspectiveforchromaticorthogonalityforimplementinginphotolithography