Synthesized of gallium Nitride/PSi nano thin films using 532 nm wavelength by pulsed laser deposition technique

The porous silicon (PSi) substrate was accurately synthesized using photoelectrochemical etching. A Nanofilm gallium nitride (GaN) was then precisely deposited on this PSi substrate using pulsed laser deposition (PLD). The x-ray diffraction (XRD) investigation revealed the GaN layer's distinct...

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Bibliographic Details
Main Authors: Abeer Abbas, Ali Alwahib, Makram Fakhri, Subash C. B. Gopinath, U. Hashim
Format: Article
Language:English
Published: Unviversity of Technology- Iraq 2024-10-01
Series:Engineering and Technology Journal
Subjects:
Online Access:https://etj.uotechnology.edu.iq/article_184106_ca4e0a9a13cb57aac6903b1a3ab8d1de.pdf