Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors
In metallized film capacitors, there exists an air gap of about 0.2 μ m between the films, with a pressure ranging generally from 1–30 atm. Because of the created potential difference between the two films, a microdischarge is formed in this gap. In this paper, we use an implicit particle-in-cell Mo...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
IOP Publishing
2014-01-01
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| Series: | New Journal of Physics |
| Subjects: | |
| Online Access: | https://doi.org/10.1088/1367-2630/16/11/113036 |