Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors

In metallized film capacitors, there exists an air gap of about 0.2 μ m between the films, with a pressure ranging generally from 1–30 atm. Because of the created potential difference between the two films, a microdischarge is formed in this gap. In this paper, we use an implicit particle-in-cell Mo...

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Bibliographic Details
Main Authors: Wei Jiang, Ya Zhang, Annemie Bogaerts
Format: Article
Language:English
Published: IOP Publishing 2014-01-01
Series:New Journal of Physics
Subjects:
Online Access:https://doi.org/10.1088/1367-2630/16/11/113036
Description
Summary:In metallized film capacitors, there exists an air gap of about 0.2 μ m between the films, with a pressure ranging generally from 1–30 atm. Because of the created potential difference between the two films, a microdischarge is formed in this gap. In this paper, we use an implicit particle-in-cell Monte Carlo collision simulation method to study the discharge properties in this direct-current microdischarge with 0.2 μ m gap in a range of different voltages and pressures. The discharge process is significantly different from a conventional high pressure discharge. Indeed, the high electric field due to the small gap sustains the discharge by field emission. At low applied voltage (∼15 V), only the electrons are generated by field emission, while both electrons and ions are generated as a stable glow discharge at medium applied voltage (∼50 V). At still higher applied voltage (∼100 V), the number of electrons and ions rapidly multiplies, the electric field reverses, and the discharge changes from a glow to an arc regime.
ISSN:1367-2630