Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors
In metallized film capacitors, there exists an air gap of about 0.2 μ m between the films, with a pressure ranging generally from 1–30 atm. Because of the created potential difference between the two films, a microdischarge is formed in this gap. In this paper, we use an implicit particle-in-cell Mo...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
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IOP Publishing
2014-01-01
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| Series: | New Journal of Physics |
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| Online Access: | https://doi.org/10.1088/1367-2630/16/11/113036 |
| _version_ | 1827874247534444544 |
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| author | Wei Jiang Ya Zhang Annemie Bogaerts |
| author_facet | Wei Jiang Ya Zhang Annemie Bogaerts |
| author_sort | Wei Jiang |
| collection | DOAJ |
| description | In metallized film capacitors, there exists an air gap of about 0.2 μ m between the films, with a pressure ranging generally from 1–30 atm. Because of the created potential difference between the two films, a microdischarge is formed in this gap. In this paper, we use an implicit particle-in-cell Monte Carlo collision simulation method to study the discharge properties in this direct-current microdischarge with 0.2 μ m gap in a range of different voltages and pressures. The discharge process is significantly different from a conventional high pressure discharge. Indeed, the high electric field due to the small gap sustains the discharge by field emission. At low applied voltage (∼15 V), only the electrons are generated by field emission, while both electrons and ions are generated as a stable glow discharge at medium applied voltage (∼50 V). At still higher applied voltage (∼100 V), the number of electrons and ions rapidly multiplies, the electric field reverses, and the discharge changes from a glow to an arc regime. |
| first_indexed | 2024-03-12T16:49:32Z |
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| id | doaj.art-570513e82a034097ae76f8eccd254037 |
| institution | Directory Open Access Journal |
| issn | 1367-2630 |
| language | English |
| last_indexed | 2024-03-12T16:49:32Z |
| publishDate | 2014-01-01 |
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| series | New Journal of Physics |
| spelling | doaj.art-570513e82a034097ae76f8eccd2540372023-08-08T11:24:00ZengIOP PublishingNew Journal of Physics1367-26302014-01-01161111303610.1088/1367-2630/16/11/113036Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitorsWei Jiang0Ya Zhang1Annemie Bogaerts2School of Physics, Huazhong University of Science and Technology, Wuhan 430074, Peopleʼs Republic of China; Centre for Mathematical Plasma-Astrophysics, Department of Mathematics, Katholieke Universiteit Leuven, B-3001 Leuven, BelgiumSchool of Physics, Huazhong University of Science and Technology, Wuhan 430074, Peopleʼs Republic of China; Research group PLASMANT, Department of Chemistry University of Antwerp, B-2610 Wilrijk-Antwerp, BelgiumResearch group PLASMANT, Department of Chemistry University of Antwerp, B-2610 Wilrijk-Antwerp, BelgiumIn metallized film capacitors, there exists an air gap of about 0.2 μ m between the films, with a pressure ranging generally from 1–30 atm. Because of the created potential difference between the two films, a microdischarge is formed in this gap. In this paper, we use an implicit particle-in-cell Monte Carlo collision simulation method to study the discharge properties in this direct-current microdischarge with 0.2 μ m gap in a range of different voltages and pressures. The discharge process is significantly different from a conventional high pressure discharge. Indeed, the high electric field due to the small gap sustains the discharge by field emission. At low applied voltage (∼15 V), only the electrons are generated by field emission, while both electrons and ions are generated as a stable glow discharge at medium applied voltage (∼50 V). At still higher applied voltage (∼100 V), the number of electrons and ions rapidly multiplies, the electric field reverses, and the discharge changes from a glow to an arc regime.https://doi.org/10.1088/1367-2630/16/11/113036micro plasmametallized film capacitorsparticle in cell |
| spellingShingle | Wei Jiang Ya Zhang Annemie Bogaerts Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors New Journal of Physics micro plasma metallized film capacitors particle in cell |
| title | Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors |
| title_full | Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors |
| title_fullStr | Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors |
| title_full_unstemmed | Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors |
| title_short | Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors |
| title_sort | numerical characterization of local electrical breakdown in sub micrometer metallized film capacitors |
| topic | micro plasma metallized film capacitors particle in cell |
| url | https://doi.org/10.1088/1367-2630/16/11/113036 |
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