Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment

Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment

Water-based bio-sourced resists are promising candidates as alternatives for deep ultraviolet (DUV) lithography by replacing current photoresists issued from petro-chemistry for microelectronics application. Chitosan films produced from seafood industry wastes enable patterning processes free of org...

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Bibliographic Details
Main Authors: Isabelle Servin, Alexandre Teolis, Arnaud Bazin, Paule Durin, Olha Sysova, Corinne Gablin, Benoît Saudet, Didier Leonard, Olivier Soppera, Jean-Louis Leclercq, Yann Chevolot, Raluca Tiron, Thierry Delair, Stéphane Trombotto
Format: Article
Language:English
Published: Elsevier 2023-06-01
Series:Micro and Nano Engineering
Subjects:
Lithography
Photoresist
Chitosan
Water-based
Semiconductor
Industrial pre-transfer
Online Access:http://www.sciencedirect.com/science/article/pii/S2590007223000321

Internet

http://www.sciencedirect.com/science/article/pii/S2590007223000321

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