Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment
Water-based bio-sourced resists are promising candidates as alternatives for deep ultraviolet (DUV) lithography by replacing current photoresists issued from petro-chemistry for microelectronics application. Chitosan films produced from seafood industry wastes enable patterning processes free of org...
| Main Authors: | , , , , , , , , , , , , , |
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| Format: | Article |
| Language: | English |
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Elsevier
2023-06-01
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| Series: | Micro and Nano Engineering |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2590007223000321 |
| _version_ | 1797798664455847936 |
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| author | Isabelle Servin Alexandre Teolis Arnaud Bazin Paule Durin Olha Sysova Corinne Gablin Benoît Saudet Didier Leonard Olivier Soppera Jean-Louis Leclercq Yann Chevolot Raluca Tiron Thierry Delair Stéphane Trombotto |
| author_facet | Isabelle Servin Alexandre Teolis Arnaud Bazin Paule Durin Olha Sysova Corinne Gablin Benoît Saudet Didier Leonard Olivier Soppera Jean-Louis Leclercq Yann Chevolot Raluca Tiron Thierry Delair Stéphane Trombotto |
| author_sort | Isabelle Servin |
| collection | DOAJ |
| description | Water-based bio-sourced resists are promising candidates as alternatives for deep ultraviolet (DUV) lithography by replacing current photoresists issued from petro-chemistry for microelectronics application. Chitosan films produced from seafood industry wastes enable patterning processes free of organic solvent and alkali-based developers, by substitution with water. After demonstrating high-resolution patterning at lab-scale after transfer into silica 10 mm wafer, we investigate here the industrial pre-transfer chitosan-based photoresist on the 300 mm pilot line scale at CEA-Leti for 193 nm DUV lithography. |
| first_indexed | 2024-03-13T04:08:16Z |
| format | Article |
| id | doaj.art-57a2cac1f6b7476b85a0a97d5ede671b |
| institution | Directory Open Access Journal |
| issn | 2590-0072 |
| language | English |
| last_indexed | 2024-03-13T04:08:16Z |
| publishDate | 2023-06-01 |
| publisher | Elsevier |
| record_format | Article |
| series | Micro and Nano Engineering |
| spelling | doaj.art-57a2cac1f6b7476b85a0a97d5ede671b2023-06-21T06:58:56ZengElsevierMicro and Nano Engineering2590-00722023-06-0119100202Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environmentIsabelle Servin0Alexandre Teolis1Arnaud Bazin2Paule Durin3Olha Sysova4Corinne Gablin5Benoît Saudet6Didier Leonard7Olivier Soppera8Jean-Louis Leclercq9Yann Chevolot10Raluca Tiron11Thierry Delair12Stéphane Trombotto13Univ. Grenoble Alpes, CEA, LETI, Grenoble F-38000, France; Corresponding author.Univ Lyon, Université Claude Bernard Lyon 1, CNRS, Ingénierie des Matériaux Polymères, IMP UMR 5223, F-69622 Villeurbanne Cedex, FranceUniv. Grenoble Alpes, CEA, LETI, Grenoble F-38000, FranceUniv Lyon, CNRS, INSA Lyon, Ecole Centrale de Lyon, Université Claude Bernard Lyon 1, CPE Lyon, INL, UMR5270, F-69134 Ecully, France; Univ. Lyon, CNRS, Université Claude Bernard Lyon 1, Institut des Sciences Analytiques, UMR 5280, 5, rue de la Doua, F-69100 Villeurbanne, FranceUniv. de Haute-Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France; Univ. de Strasbourg, F-67000 Strasbourg, FranceUniv. Lyon, CNRS, Université Claude Bernard Lyon 1, Institut des Sciences Analytiques, UMR 5280, 5, rue de la Doua, F-69100 Villeurbanne, FranceUniv. Grenoble Alpes, CEA, LETI, Grenoble F-38000, FranceUniv. Lyon, CNRS, Université Claude Bernard Lyon 1, Institut des Sciences Analytiques, UMR 5280, 5, rue de la Doua, F-69100 Villeurbanne, FranceUniv. de Haute-Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France; Univ. de Strasbourg, F-67000 Strasbourg, FranceUniv Lyon, CNRS, INSA Lyon, Ecole Centrale de Lyon, Université Claude Bernard Lyon 1, CPE Lyon, INL, UMR5270, F-69134 Ecully, FranceUniv Lyon, CNRS, INSA Lyon, Ecole Centrale de Lyon, Université Claude Bernard Lyon 1, CPE Lyon, INL, UMR5270, F-69134 Ecully, FranceUniv. Grenoble Alpes, CEA, LETI, Grenoble F-38000, FranceUniv Lyon, Université Claude Bernard Lyon 1, CNRS, Ingénierie des Matériaux Polymères, IMP UMR 5223, F-69622 Villeurbanne Cedex, FranceUniv Lyon, Université Claude Bernard Lyon 1, CNRS, Ingénierie des Matériaux Polymères, IMP UMR 5223, F-69622 Villeurbanne Cedex, FranceWater-based bio-sourced resists are promising candidates as alternatives for deep ultraviolet (DUV) lithography by replacing current photoresists issued from petro-chemistry for microelectronics application. Chitosan films produced from seafood industry wastes enable patterning processes free of organic solvent and alkali-based developers, by substitution with water. After demonstrating high-resolution patterning at lab-scale after transfer into silica 10 mm wafer, we investigate here the industrial pre-transfer chitosan-based photoresist on the 300 mm pilot line scale at CEA-Leti for 193 nm DUV lithography.http://www.sciencedirect.com/science/article/pii/S2590007223000321LithographyPhotoresistChitosanWater-basedSemiconductorIndustrial pre-transfer |
| spellingShingle | Isabelle Servin Alexandre Teolis Arnaud Bazin Paule Durin Olha Sysova Corinne Gablin Benoît Saudet Didier Leonard Olivier Soppera Jean-Louis Leclercq Yann Chevolot Raluca Tiron Thierry Delair Stéphane Trombotto Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment Micro and Nano Engineering Lithography Photoresist Chitosan Water-based Semiconductor Industrial pre-transfer |
| title | Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment |
| title_full | Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment |
| title_fullStr | Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment |
| title_full_unstemmed | Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment |
| title_short | Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment |
| title_sort | water soluble bio sourced resists for duv lithography in a 200 300 mm pilot line environment |
| topic | Lithography Photoresist Chitosan Water-based Semiconductor Industrial pre-transfer |
| url | http://www.sciencedirect.com/science/article/pii/S2590007223000321 |
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