Inscribing diffraction grating inside silicon substrate using a subnanosecond laser in one photon absorption wavelength

Abstract Using focused subnanosecond laser pulses at $$1.064\,\upmu \hbox {m}$$ 1.064 μ m wavelength, modification of silicon into opaque state was induced. While silicon exhibits one-photon absorption at this wavelength, the modification was induced inside $$300\,\upmu \hbox {m}$$ 300 μ m -thick si...

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Bibliographic Details
Main Authors: Kozo Sugimoto, Shigeki Matsuo, Yoshiki Naoi
Format: Article
Language:English
Published: Nature Portfolio 2020-12-01
Series:Scientific Reports
Online Access:https://doi.org/10.1038/s41598-020-78564-z