Inscribing diffraction grating inside silicon substrate using a subnanosecond laser in one photon absorption wavelength
Abstract Using focused subnanosecond laser pulses at $$1.064\,\upmu \hbox {m}$$ 1.064 μ m wavelength, modification of silicon into opaque state was induced. While silicon exhibits one-photon absorption at this wavelength, the modification was induced inside $$300\,\upmu \hbox {m}$$ 300 μ m -thick si...
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| Format: | Article |
| Language: | English |
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Nature Portfolio
2020-12-01
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| Series: | Scientific Reports |
| Online Access: | https://doi.org/10.1038/s41598-020-78564-z |
| _version_ | 1818430791652212736 |
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| author | Kozo Sugimoto Shigeki Matsuo Yoshiki Naoi |
| author_facet | Kozo Sugimoto Shigeki Matsuo Yoshiki Naoi |
| author_sort | Kozo Sugimoto |
| collection | DOAJ |
| description | Abstract Using focused subnanosecond laser pulses at $$1.064\,\upmu \hbox {m}$$ 1.064 μ m wavelength, modification of silicon into opaque state was induced. While silicon exhibits one-photon absorption at this wavelength, the modification was induced inside $$300\,\upmu \hbox {m}$$ 300 μ m -thick silicon substrate without damaging top or bottom surfaces. The depth range of the focus position was investigated where inside of the substrate can be modified without damaging the surfaces. Using this technique, diffraction gratings were inscribed inside silicon substrate. Diffraction from the gratings were observed, and the diffraction angle well agreed with the theoretical value. These results demonstrate that this technique could be used for fabricating infrared optical elements in silicon. |
| first_indexed | 2024-12-14T15:39:02Z |
| format | Article |
| id | doaj.art-57fc66334f8140fd9bb6d97ac1875417 |
| institution | Directory Open Access Journal |
| issn | 2045-2322 |
| language | English |
| last_indexed | 2024-12-14T15:39:02Z |
| publishDate | 2020-12-01 |
| publisher | Nature Portfolio |
| record_format | Article |
| series | Scientific Reports |
| spelling | doaj.art-57fc66334f8140fd9bb6d97ac18754172022-12-21T22:55:39ZengNature PortfolioScientific Reports2045-23222020-12-011011710.1038/s41598-020-78564-zInscribing diffraction grating inside silicon substrate using a subnanosecond laser in one photon absorption wavelengthKozo Sugimoto0Shigeki Matsuo1Yoshiki Naoi2Department of Mechanical Engineering, Shibaura Institute of TechnologyDepartment of Mechanical Engineering, Shibaura Institute of TechnologyGraduate School of Technology, Industrial and Social Science, Tokushima UniversityAbstract Using focused subnanosecond laser pulses at $$1.064\,\upmu \hbox {m}$$ 1.064 μ m wavelength, modification of silicon into opaque state was induced. While silicon exhibits one-photon absorption at this wavelength, the modification was induced inside $$300\,\upmu \hbox {m}$$ 300 μ m -thick silicon substrate without damaging top or bottom surfaces. The depth range of the focus position was investigated where inside of the substrate can be modified without damaging the surfaces. Using this technique, diffraction gratings were inscribed inside silicon substrate. Diffraction from the gratings were observed, and the diffraction angle well agreed with the theoretical value. These results demonstrate that this technique could be used for fabricating infrared optical elements in silicon.https://doi.org/10.1038/s41598-020-78564-z |
| spellingShingle | Kozo Sugimoto Shigeki Matsuo Yoshiki Naoi Inscribing diffraction grating inside silicon substrate using a subnanosecond laser in one photon absorption wavelength Scientific Reports |
| title | Inscribing diffraction grating inside silicon substrate using a subnanosecond laser in one photon absorption wavelength |
| title_full | Inscribing diffraction grating inside silicon substrate using a subnanosecond laser in one photon absorption wavelength |
| title_fullStr | Inscribing diffraction grating inside silicon substrate using a subnanosecond laser in one photon absorption wavelength |
| title_full_unstemmed | Inscribing diffraction grating inside silicon substrate using a subnanosecond laser in one photon absorption wavelength |
| title_short | Inscribing diffraction grating inside silicon substrate using a subnanosecond laser in one photon absorption wavelength |
| title_sort | inscribing diffraction grating inside silicon substrate using a subnanosecond laser in one photon absorption wavelength |
| url | https://doi.org/10.1038/s41598-020-78564-z |
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