Inscribing diffraction grating inside silicon substrate using a subnanosecond laser in one photon absorption wavelength
Abstract Using focused subnanosecond laser pulses at $$1.064\,\upmu \hbox {m}$$ 1.064 μ m wavelength, modification of silicon into opaque state was induced. While silicon exhibits one-photon absorption at this wavelength, the modification was induced inside $$300\,\upmu \hbox {m}$$ 300 μ m -thick si...
Main Authors: | Kozo Sugimoto, Shigeki Matsuo, Yoshiki Naoi |
---|---|
Format: | Article |
Language: | English |
Published: |
Nature Portfolio
2020-12-01
|
Series: | Scientific Reports |
Online Access: | https://doi.org/10.1038/s41598-020-78564-z |
Similar Items
-
SUBNANOSECOND X-RAY-POWDER DIFFRACTION
by: Woolsey, N, et al.
Published: (1990) -
High-Efficiency Multilevel Volume Diffraction Gratings inside Silicon
by: Mehmet Bütün, et al.
Published: (2023-10-01) -
SUBNANOSECOND X-RAY-DIFFRACTION FROM LASER-SHOCKED CRYSTALS
by: Wark, J, et al.
Published: (1989) -
Investigation on Periodically Surface-Corrugated Long-Period Gratings Inscribed on Photonic Crystal Fibers
by: Young-Geun Han
Published: (2017-04-01) -
Reconfigurable Microwave Photonic Filter Based on Long Period Gratings Inscribed in Multicore Fibers
by: Liang Huo, et al.
Published: (2019-01-01)