Modified robust sliding-mode control method for wafer scanner
This article studies the precision motion control of a long-stroke reticle stage driven by the permanent magnet linear motor in wafer scanner. A robust sliding-mode control method is proposed for tracking the reference trajectory in the presence of un-modeled dynamics, parametric uncertainty and ext...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
SAGE Publishing
2015-03-01
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| Series: | Advances in Mechanical Engineering |
| Online Access: | https://doi.org/10.1177/1687814015577599 |