On the Mixed Gas Behavior of Organosilica Membranes Fabricated by Plasma-Enhanced Chemical Vapor Deposition (PECVD)

Selective, nanometer-thin organosilica layers created by plasma-enhanced chemical vapor deposition (PECVD) exhibit selective gas permeation behavior. Despite their promising pure gas performance, published data with regard to mixed gas behavior are still severely lacking. This study endeavors to clo...

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Bibliographic Details
Main Authors: Jens Rubner, Soukaina Skribbe, Hannah Roth, Lara Kleines, Rainer Dahlmann, Matthias Wessling
Format: Article
Language:English
Published: MDPI AG 2022-10-01
Series:Membranes
Subjects:
Online Access:https://www.mdpi.com/2077-0375/12/10/994