NEAR INFRARED PHOTOLUMINESCENCE OF THE HYDROGENATED AMORPHOUS SILICON THIN FILMS WITH IN-SITU EMBEDDED SILICON NANOPARTICLES

The intrinsic hydrogenated silicone layers with embedded silicon nanoparticles were grown in-situ at 250°C on glass substrates by the radio frequency plasma enhanced chemical vapor deposition (CVD) from silane highly diluted in hydrogen. The changes in the optical absorption coefficient were detecte...

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Main Authors: Z. Remes, J. Stuchlik, Purkrt A., Ledinsky M., Kupcik J.
Format: Article
Language:English
Published: University of Chemistry and Technology, Prague 2017-03-01
Series:Ceramics-Silikáty
Subjects:
Online Access: http://www.ceramics-silikaty.cz/index.php?page=cs_detail_doi&id=876
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author Z. Remes
J. Stuchlik
Purkrt A.
Ledinsky M.
Kupcik J.
author_facet Z. Remes
J. Stuchlik
Purkrt A.
Ledinsky M.
Kupcik J.
author_sort Z. Remes
collection DOAJ
description The intrinsic hydrogenated silicone layers with embedded silicon nanoparticles were grown in-situ at 250°C on glass substrates by the radio frequency plasma enhanced chemical vapor deposition (CVD) from silane highly diluted in hydrogen. The changes in the optical absorption coefficient were detected by the photothemal deflection spectroscopy (PDS). The transition from amorphous to crystalline phase for samples deposited at 5−6% silane concentration correlates to the crystalline volume fraction about 50% as detected by Raman spectroscopy and the high resolution transmission electron microscopy (HRTEM). The room temperature photo-luminescence increases significantly with increased crystallinity volume fraction but diminishes abruptly when crystallinity volume fraction exceeds above 80%. The photoluminescence intensity strongly correlates with the presence of isolated silicon nanoparticles in the mixed amorphous and crystalline phase. The strongest photoluminescence was found in the sample with mixed phase of amorphous matrix and isolated silicon nanoparticles and the crystalline volume fraction about 50%.
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spelling doaj.art-5cb7729e8ffe4b5ca1b816abfbb936b42022-12-22T03:41:21ZengUniversity of Chemistry and Technology, PragueCeramics-Silikáty0862-54681804-58472017-03-0161213614010.13168/cs.2017.000810.13168/cs.2017.0008.20170502100402NEAR INFRARED PHOTOLUMINESCENCE OF THE HYDROGENATED AMORPHOUS SILICON THIN FILMS WITH IN-SITU EMBEDDED SILICON NANOPARTICLESZ. Remes0J. Stuchlik1Purkrt A.2Ledinsky M.3Kupcik J. Institute of Physics CAS CR, Cukrovarnicka 10,162 00 Prague 6, Czech Republic Institute of Physics CAS CR, Cukrovarnicka 10,162 00 Prague 6, Czech Republic Institute of Physics CAS CR, Cukrovarnicka 10,162 00 Prague 6, Czech Republic Institute of Physics CAS CR, Cukrovarnicka 10,162 00 Prague 6, Czech Republic The intrinsic hydrogenated silicone layers with embedded silicon nanoparticles were grown in-situ at 250°C on glass substrates by the radio frequency plasma enhanced chemical vapor deposition (CVD) from silane highly diluted in hydrogen. The changes in the optical absorption coefficient were detected by the photothemal deflection spectroscopy (PDS). The transition from amorphous to crystalline phase for samples deposited at 5−6% silane concentration correlates to the crystalline volume fraction about 50% as detected by Raman spectroscopy and the high resolution transmission electron microscopy (HRTEM). The room temperature photo-luminescence increases significantly with increased crystallinity volume fraction but diminishes abruptly when crystallinity volume fraction exceeds above 80%. The photoluminescence intensity strongly correlates with the presence of isolated silicon nanoparticles in the mixed amorphous and crystalline phase. The strongest photoluminescence was found in the sample with mixed phase of amorphous matrix and isolated silicon nanoparticles and the crystalline volume fraction about 50%. http://www.ceramics-silikaty.cz/index.php?page=cs_detail_doi&id=876 Amorphous silicon Chemical vapor deposition Photothermal deflection spectroscopy
spellingShingle Z. Remes
J. Stuchlik
Purkrt A.
Ledinsky M.
Kupcik J.
NEAR INFRARED PHOTOLUMINESCENCE OF THE HYDROGENATED AMORPHOUS SILICON THIN FILMS WITH IN-SITU EMBEDDED SILICON NANOPARTICLES
Ceramics-Silikáty
Amorphous silicon
Chemical vapor deposition
Photothermal deflection spectroscopy
title NEAR INFRARED PHOTOLUMINESCENCE OF THE HYDROGENATED AMORPHOUS SILICON THIN FILMS WITH IN-SITU EMBEDDED SILICON NANOPARTICLES
title_full NEAR INFRARED PHOTOLUMINESCENCE OF THE HYDROGENATED AMORPHOUS SILICON THIN FILMS WITH IN-SITU EMBEDDED SILICON NANOPARTICLES
title_fullStr NEAR INFRARED PHOTOLUMINESCENCE OF THE HYDROGENATED AMORPHOUS SILICON THIN FILMS WITH IN-SITU EMBEDDED SILICON NANOPARTICLES
title_full_unstemmed NEAR INFRARED PHOTOLUMINESCENCE OF THE HYDROGENATED AMORPHOUS SILICON THIN FILMS WITH IN-SITU EMBEDDED SILICON NANOPARTICLES
title_short NEAR INFRARED PHOTOLUMINESCENCE OF THE HYDROGENATED AMORPHOUS SILICON THIN FILMS WITH IN-SITU EMBEDDED SILICON NANOPARTICLES
title_sort near infrared photoluminescence of the hydrogenated amorphous silicon thin films with in situ embedded silicon nanoparticles
topic Amorphous silicon
Chemical vapor deposition
Photothermal deflection spectroscopy
url http://www.ceramics-silikaty.cz/index.php?page=cs_detail_doi&id=876
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AT purkrta nearinfraredphotoluminescenceofthehydrogenatedamorphoussiliconthinfilmswithinsituembeddedsiliconnanoparticles
AT ledinskym nearinfraredphotoluminescenceofthehydrogenatedamorphoussiliconthinfilmswithinsituembeddedsiliconnanoparticles
AT kupcikj nearinfraredphotoluminescenceofthehydrogenatedamorphoussiliconthinfilmswithinsituembeddedsiliconnanoparticles