Formation of Nano-Fibrous Patterns on Aluminum Substrates via Photolithographic Fabrication of Electrospun Photosensitive Polyimide Fibrous Membranes

Formation of Nano-Fibrous Patterns on Aluminum Substrates via Photolithographic Fabrication of Electrospun Photosensitive Polyimide Fibrous Membranes

The formation of polymeric micro-patterns on various substrates via a photolithography procedure has been widely used in semiconductor fabrication. Standard polymer patterns are usually fabricated via photosensitive polymer varnishes, in which large amounts of potentially harmful solvents with weigh...

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Bibliographic Details
Main Authors: Yan-shuang Gao, Xi Ren, Xuan-zhe Du, Zhen-zhong Wang, Zhi-bin He, Shun-qi Yuan, Zhen Pan, Yan Zhang, Xin-xin Zhi, Jin-gang Liu
Format: Article
Language:English
Published: MDPI AG 2022-08-01
Series:Nanomaterials
Subjects:
photosensitive polyimide
electrospinning
nano-fibrous membrane
photolithography
pattern
Online Access:https://www.mdpi.com/2079-4991/12/16/2745

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