Tunable atomic force microscopy bias lithography on electron beam induced carbonaceous platforms
Tunable local electrochemical and physical modifications on the carbonaceous platforms are achieved using Atomic force microscope (AFM) bias lithography. These carbonaceous platforms are produced on Si substrate by the technique called electron beam induced carbonaceous deposition (EBICD). EBICD is...
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| Format: | Article |
| Language: | English |
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AIP Publishing LLC
2013-09-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.4821271 |