Performance of amorphization AlCrTiZrMo high entropy alloy barrier for copper metallization

A reliable ultra-thin diffusion barrier is required for Cu interconnection. High entropy alloy (HEA) films have received attention in the development of diffusion barrier materials due to their remarkable properties. Here, the dense and smooth 17 nm AlCrTiZrMo high entropy alloy amorphous film (HEAA...

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Bibliographic Details
Main Authors: Shunian Chen, Yifan Zhang, Lin Chen, Xiaoping Ouyang, Bin Liao
Format: Article
Language:English
Published: Elsevier 2024-01-01
Series:Journal of Materials Research and Technology
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S223878542303209X