A Multi-level Memristor Based on Al-Doped HfO2 Thin Film

Abstract Non-volatile memory (NVM) will play a very important role in the next-generation digital technologies, including the Internet of things. The metal-oxide memristors, especially based on HfO2, have been favored by lots of researchers because of its simple structure, high integration, fast ope...

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Bibliographic Details
Main Authors: Lei Wu, Hongxia Liu, Jiabin Li, Shulong Wang, Xing Wang
Format: Article
Language:English
Published: SpringerOpen 2019-05-01
Series:Nanoscale Research Letters
Subjects:
Online Access:http://link.springer.com/article/10.1186/s11671-019-3015-x