28-nm FD-SOI CMOS RF Figures of Merit Down to 4.2 K

This work presents a detailed RF characterization of 28-nm FD-SOI nMOSFETs at cryogenic temperatures down to 4.2 K. Two main RF Figures of Merit (FoMs), i.e., current-gain cutoff frequency (f<sub>t</sub>) and maximum oscillation frequency (f<sub>max</sub>), as well as parasit...

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Main Authors: Lucas Nyssens, Arka Halder, Babak Kazemi Esfeh, Nicolas Planes, Denis Flandre, Valeriya Kilchytska, Jean-Pierre Raskin
Format: Article
Language:English
Published: IEEE 2020-01-01
Series:IEEE Journal of the Electron Devices Society
Subjects:
Online Access:https://ieeexplore.ieee.org/document/9117028/
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author Lucas Nyssens
Arka Halder
Babak Kazemi Esfeh
Nicolas Planes
Denis Flandre
Valeriya Kilchytska
Jean-Pierre Raskin
author_facet Lucas Nyssens
Arka Halder
Babak Kazemi Esfeh
Nicolas Planes
Denis Flandre
Valeriya Kilchytska
Jean-Pierre Raskin
author_sort Lucas Nyssens
collection DOAJ
description This work presents a detailed RF characterization of 28-nm FD-SOI nMOSFETs at cryogenic temperatures down to 4.2 K. Two main RF Figures of Merit (FoMs), i.e., current-gain cutoff frequency (f<sub>t</sub>) and maximum oscillation frequency (f<sub>max</sub>), as well as parasitic elements of the small-signal equivalent circuit, are extracted from the measured S-parameters. An improvement of up to ~130 GHz in f<sub>t</sub> and ~75 GHz in f<sub>max</sub> is observed for the shortest device (25 nm) at low temperature. The behavior of RF FoMs versus temperature is discussed in terms of small-signal equivalent circuit elements, both intrinsic and extrinsic (parasitics). This study suggests 28-nm FD-SOI nMOSFETs as a good candidate for future cryogenic applications down to 4.2 K and clarifies the origin and limitations of the performance.
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spelling doaj.art-604d5dc80ab54f939d62a7e5ef1228322022-12-21T22:22:30ZengIEEEIEEE Journal of the Electron Devices Society2168-67342020-01-01864665410.1109/JEDS.2020.3002201911702828-nm FD-SOI CMOS RF Figures of Merit Down to 4.2 KLucas Nyssens0https://orcid.org/0000-0003-3996-7553Arka Halder1Babak Kazemi Esfeh2https://orcid.org/0000-0002-3104-890XNicolas Planes3Denis Flandre4https://orcid.org/0000-0001-5298-5196Valeriya Kilchytska5Jean-Pierre Raskin6https://orcid.org/0000-0001-9715-9699Institute of Information and Communication Technologies, Electronics and Applied Mathematics, Universit&#x00E9; catholique de Louvain, Louvain-la-Neuve, BelgiumInstitute of Information and Communication Technologies, Electronics and Applied Mathematics, Universit&#x00E9; catholique de Louvain, Louvain-la-Neuve, BelgiumInstitute of Information and Communication Technologies, Electronics and Applied Mathematics, Universit&#x00E9; catholique de Louvain, Louvain-la-Neuve, BelgiumST-Microelectronics, Crolles, FranceInstitute of Information and Communication Technologies, Electronics and Applied Mathematics, Universit&#x00E9; catholique de Louvain, Louvain-la-Neuve, BelgiumInstitute of Information and Communication Technologies, Electronics and Applied Mathematics, Universit&#x00E9; catholique de Louvain, Louvain-la-Neuve, BelgiumInstitute of Information and Communication Technologies, Electronics and Applied Mathematics, Universit&#x00E9; catholique de Louvain, Louvain-la-Neuve, BelgiumThis work presents a detailed RF characterization of 28-nm FD-SOI nMOSFETs at cryogenic temperatures down to 4.2 K. Two main RF Figures of Merit (FoMs), i.e., current-gain cutoff frequency (f<sub>t</sub>) and maximum oscillation frequency (f<sub>max</sub>), as well as parasitic elements of the small-signal equivalent circuit, are extracted from the measured S-parameters. An improvement of up to ~130 GHz in f<sub>t</sub> and ~75 GHz in f<sub>max</sub> is observed for the shortest device (25 nm) at low temperature. The behavior of RF FoMs versus temperature is discussed in terms of small-signal equivalent circuit elements, both intrinsic and extrinsic (parasitics). This study suggests 28-nm FD-SOI nMOSFETs as a good candidate for future cryogenic applications down to 4.2 K and clarifies the origin and limitations of the performance.https://ieeexplore.ieee.org/document/9117028/28-nm FD-SOIUTBB MOSFETcryogenic CMOSRF figures of meritsmall-signal modelingliquid helium temperature
spellingShingle Lucas Nyssens
Arka Halder
Babak Kazemi Esfeh
Nicolas Planes
Denis Flandre
Valeriya Kilchytska
Jean-Pierre Raskin
28-nm FD-SOI CMOS RF Figures of Merit Down to 4.2 K
IEEE Journal of the Electron Devices Society
28-nm FD-SOI
UTBB MOSFET
cryogenic CMOS
RF figures of merit
small-signal modeling
liquid helium temperature
title 28-nm FD-SOI CMOS RF Figures of Merit Down to 4.2 K
title_full 28-nm FD-SOI CMOS RF Figures of Merit Down to 4.2 K
title_fullStr 28-nm FD-SOI CMOS RF Figures of Merit Down to 4.2 K
title_full_unstemmed 28-nm FD-SOI CMOS RF Figures of Merit Down to 4.2 K
title_short 28-nm FD-SOI CMOS RF Figures of Merit Down to 4.2 K
title_sort 28 nm fd soi cmos rf figures of merit down to 4 2 k
topic 28-nm FD-SOI
UTBB MOSFET
cryogenic CMOS
RF figures of merit
small-signal modeling
liquid helium temperature
url https://ieeexplore.ieee.org/document/9117028/
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