Copper removal from semiconductor CMP wastewater in the presence of nano-SiO2 through biosorption
Copper-bearing wastewater from chemical mechanical planarization (CMP) is a typical semiconductor development byproduct. How to effectively treat Cu2+ in the CMP wastewater is a great concern in the microchip manufacturing industry. In this study, we investigated the potential for the microbial remo...
| Main Authors: | , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
IWA Publishing
2021-06-01
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| Series: | Water Reuse |
| Subjects: | |
| Online Access: | http://jwrd.iwaponline.com/content/11/2/289 |