Process Optimization Based on Analysis of Dynamic and Static Performance Requirements of Ion Beam Figuring Machine Tools for Sub-Nanometer Figuring
Extreme ultraviolet lithography objective lenses require surface figure accuracy of approximately sub-nanometer root mean square (RMS). As the key equipment for sub-nanometer accuracy figuring, the dynamic and static performance of ion beam figuring (IBF) machine tools are critical. However, the rel...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2022-11-01
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| Series: | Photonics |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2304-6732/9/11/839 |