Improvement of the magnetic properties of Nd–Fe–B/glass two-layer films deposited on Si substrates

In a previous study, the authors developed Nd–Fe–B/glass two-layer films deposited on Si substrates using pulsed laser deposition for micro electro mechanical systems. Here, the fabrication conditions of the films were investigated to determine the optimum conditions that enhance the magnetic proper...

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Main Authors: M. Nakano, K. Higuchi, H. Yamaguchi, I. Fukuda, A. Yamashita, T. Yanai, T. Shinshi, H. Fukunaga
Format: Article
Language:English
Published: AIP Publishing LLC 2023-02-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/9.0000599
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author M. Nakano
K. Higuchi
H. Yamaguchi
I. Fukuda
A. Yamashita
T. Yanai
T. Shinshi
H. Fukunaga
author_facet M. Nakano
K. Higuchi
H. Yamaguchi
I. Fukuda
A. Yamashita
T. Yanai
T. Shinshi
H. Fukunaga
author_sort M. Nakano
collection DOAJ
description In a previous study, the authors developed Nd–Fe–B/glass two-layer films deposited on Si substrates using pulsed laser deposition for micro electro mechanical systems. Here, the fabrication conditions of the films were investigated to determine the optimum conditions that enhance the magnetic properties of the films. The annealing time in the pulse-annealing process conducted after the deposition was set to 4.0 s at Nd contents of 14 at.–16 at.%. Moreover, the effect of the glass/Nd–Fe–B thickness ratio on the magnetic properties was examined. A ratio less than 2 resulted in an increase in (BH)max up to 80 kJ/m3.
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spelling doaj.art-61ac5fc73ff444128c1e11af946fa95f2023-03-10T17:26:20ZengAIP Publishing LLCAIP Advances2158-32262023-02-01132025131025131-410.1063/9.0000599Improvement of the magnetic properties of Nd–Fe–B/glass two-layer films deposited on Si substratesM. Nakano0K. Higuchi1H. Yamaguchi2I. Fukuda3A. Yamashita4T. Yanai5T. Shinshi6H. Fukunaga7Graduate School of Engineering, Nagasaki University, Nagasaki 852-8521, JapanGraduate School of Engineering, Nagasaki University, Nagasaki 852-8521, JapanGraduate School of Engineering, Nagasaki University, Nagasaki 852-8521, JapanGraduate School of Engineering, Nagasaki University, Nagasaki 852-8521, JapanGraduate School of Engineering, Nagasaki University, Nagasaki 852-8521, JapanGraduate School of Engineering, Nagasaki University, Nagasaki 852-8521, JapanLaboratory for Future Interdisciplinary Research of Science and Technology, Institute of Innovative Research, Tokyo Institute of Technology, Yokohama 226-8503, JapanGraduate School of Engineering, Nagasaki University, Nagasaki 852-8521, JapanIn a previous study, the authors developed Nd–Fe–B/glass two-layer films deposited on Si substrates using pulsed laser deposition for micro electro mechanical systems. Here, the fabrication conditions of the films were investigated to determine the optimum conditions that enhance the magnetic properties of the films. The annealing time in the pulse-annealing process conducted after the deposition was set to 4.0 s at Nd contents of 14 at.–16 at.%. Moreover, the effect of the glass/Nd–Fe–B thickness ratio on the magnetic properties was examined. A ratio less than 2 resulted in an increase in (BH)max up to 80 kJ/m3.http://dx.doi.org/10.1063/9.0000599
spellingShingle M. Nakano
K. Higuchi
H. Yamaguchi
I. Fukuda
A. Yamashita
T. Yanai
T. Shinshi
H. Fukunaga
Improvement of the magnetic properties of Nd–Fe–B/glass two-layer films deposited on Si substrates
AIP Advances
title Improvement of the magnetic properties of Nd–Fe–B/glass two-layer films deposited on Si substrates
title_full Improvement of the magnetic properties of Nd–Fe–B/glass two-layer films deposited on Si substrates
title_fullStr Improvement of the magnetic properties of Nd–Fe–B/glass two-layer films deposited on Si substrates
title_full_unstemmed Improvement of the magnetic properties of Nd–Fe–B/glass two-layer films deposited on Si substrates
title_short Improvement of the magnetic properties of Nd–Fe–B/glass two-layer films deposited on Si substrates
title_sort improvement of the magnetic properties of nd fe b glass two layer films deposited on si substrates
url http://dx.doi.org/10.1063/9.0000599
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