Investigation of the physical properties of nanoscale porous silicon films

The structure and physical properties of porous silicon obtained by electrochemical etching of monocrystalline silicon with n-type conductivity in a mixture of hydrofluoric acid and ethyl alcohol were investigated. Experimental layers were formed by varying the etching parameters. Samples were studi...

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Main Authors: S.M. Manakov, Ye. Sagidolda
Format: Article
Language:English
Published: Al-Farabi Kazakh National University 2016-10-01
Series:Physical Sciences and Technology
Subjects:
Online Access:http://phst/index.php/journal/article/view/54
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author S.M. Manakov
Ye. Sagidolda
author_facet S.M. Manakov
Ye. Sagidolda
author_sort S.M. Manakov
collection DOAJ
description The structure and physical properties of porous silicon obtained by electrochemical etching of monocrystalline silicon with n-type conductivity in a mixture of hydrofluoric acid and ethyl alcohol were investigated. Experimental layers were formed by varying the etching parameters. Samples were studied using the methods of atomic force microscopy (AFM),scanning electron microscopy (SEM), Raman spectroscopy (RS) and photoluminescence spectrometry (PL). It was found that the PL intensity increased with increasing etching time. It was demonstrated that by varying of technological parameters and conditions of the etching process we can control the size of nanocrystals and manufacture nanostructuresof porous silicon film with improved properties.
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spelling doaj.art-61cb34b308f34455ba241527c17ad8022023-10-30T13:11:36ZengAl-Farabi Kazakh National UniversityPhysical Sciences and Technology2409-61212016-10-0121Investigation of the physical properties of nanoscale porous silicon filmsS.M. Manakov0Ye. Sagidolda1Al-Farabi Kazakh National University, NNLOT, al-Farabi 71, 050040 Almaty, KazakhstanAl-Farabi Kazakh National University, Laboratory of Engineering, al-Farabi 71, 050040 Almaty, KazakhstanThe structure and physical properties of porous silicon obtained by electrochemical etching of monocrystalline silicon with n-type conductivity in a mixture of hydrofluoric acid and ethyl alcohol were investigated. Experimental layers were formed by varying the etching parameters. Samples were studied using the methods of atomic force microscopy (AFM),scanning electron microscopy (SEM), Raman spectroscopy (RS) and photoluminescence spectrometry (PL). It was found that the PL intensity increased with increasing etching time. It was demonstrated that by varying of technological parameters and conditions of the etching process we can control the size of nanocrystals and manufacture nanostructuresof porous silicon film with improved properties.http://phst/index.php/journal/article/view/54Key wordsporous siliconelectrochemical etchingphotoluminescencenanocrystals. PACS numbers82.45.Vp
spellingShingle S.M. Manakov
Ye. Sagidolda
Investigation of the physical properties of nanoscale porous silicon films
Physical Sciences and Technology
Key words
porous silicon
electrochemical etching
photoluminescence
nanocrystals. PACS numbers
82.45.Vp
title Investigation of the physical properties of nanoscale porous silicon films
title_full Investigation of the physical properties of nanoscale porous silicon films
title_fullStr Investigation of the physical properties of nanoscale porous silicon films
title_full_unstemmed Investigation of the physical properties of nanoscale porous silicon films
title_short Investigation of the physical properties of nanoscale porous silicon films
title_sort investigation of the physical properties of nanoscale porous silicon films
topic Key words
porous silicon
electrochemical etching
photoluminescence
nanocrystals. PACS numbers
82.45.Vp
url http://phst/index.php/journal/article/view/54
work_keys_str_mv AT smmanakov investigationofthephysicalpropertiesofnanoscaleporoussiliconfilms
AT yesagidolda investigationofthephysicalpropertiesofnanoscaleporoussiliconfilms