Annealing Effect on the Growth of Nanostructured TiO2 Thin Films by Pulsed Laser Deposition (PLD)
In this work, Nanostructured TiO2 thin films were grown by pulsed laser deposition (PLD) technique on glass substrates at 300 °C. TiO2 thin films were then annealed at 400-600 °C in air for a period of 2 hours. Effect of annealing on the structure, morphology and optical properties were studied. The...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Unviversity of Technology- Iraq
2013-04-01
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| Series: | Engineering and Technology Journal |
| Subjects: | |
| Online Access: | https://etj.uotechnology.edu.iq/article_84155_7d7c1170f750e57b7210c9eacb0dfa73.pdf |