Microstructural analysis of Sn-3.0Ag-0.5Cu-TiO2 composite solder alloy after selective electrochemical etching

This work aims to provide deep morphological observation on the incorporated TiO _2 nanoparticles within the SAC305 by selective electrochemical etching. Cyclic voltammetry and chronoamperometry were used to investigate the selective etching performances. The removal of β -Sn matrix was conducted at...

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Main Authors: Muhamad Zamri Yahaya, Muhammad Firdaus Mohd Nazeri, Soorathep Kheawhom, Balázs Illés, Agata Skwarek, Ahmad Azmin Mohamad
Format: Article
Language:English
Published: IOP Publishing 2020-01-01
Series:Materials Research Express
Subjects:
Online Access:https://doi.org/10.1088/2053-1591/ab6b57
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author Muhamad Zamri Yahaya
Muhammad Firdaus Mohd Nazeri
Soorathep Kheawhom
Balázs Illés
Agata Skwarek
Ahmad Azmin Mohamad
author_facet Muhamad Zamri Yahaya
Muhammad Firdaus Mohd Nazeri
Soorathep Kheawhom
Balázs Illés
Agata Skwarek
Ahmad Azmin Mohamad
author_sort Muhamad Zamri Yahaya
collection DOAJ
description This work aims to provide deep morphological observation on the incorporated TiO _2 nanoparticles within the SAC305 by selective electrochemical etching. Cyclic voltammetry and chronoamperometry were used to investigate the selective etching performances. The removal of β -Sn matrix was conducted at a fixed potential of −350 mV. Average performances of 2.19 and 2.30 mA were attained from the chronoamperometry. The efficiency of β -Sn removal was approved according to the reduction of the intensities on the phase analysis. Successful observation of the TiO _2 near the Cu _6 Sn _5 layer was attained for an optimum duration of 120 s. Clusters of TiO _2 nanoparticles were entrapped by Cu _6 Sn _5 and Ag _3 Sn intermetallic compound (IMC) layer network and at the solder/substrate interface. The presence of TiO _2 nanoparticles at the solder interface suppresses the growth of the Cu _6 Sn _5 IMC layer. The absence of a β -Sn matrix also allowed in-depth morphological observations to be made of the shape and size of the Cu _6 Sn _5 and Ag _3 Sn. It was found that TiO _2 content facilitates the β -Sn removal, which allows better observation of the IMC phases as well as the TiO _2 reinforcement particles.
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spelling doaj.art-64ec2cfd177e40edbb2cfa5f1cbd01a32023-08-09T15:28:38ZengIOP PublishingMaterials Research Express2053-15912020-01-017101658310.1088/2053-1591/ab6b57Microstructural analysis of Sn-3.0Ag-0.5Cu-TiO2 composite solder alloy after selective electrochemical etchingMuhamad Zamri Yahaya0Muhammad Firdaus Mohd Nazeri1Soorathep Kheawhom2Balázs Illés3Agata Skwarek4Ahmad Azmin Mohamad5https://orcid.org/0000-0001-5525-7100School of Materials and Mineral Resources Engineering, Universiti Sains Malaysia , 14300, Nibong Tebal, Penang, MalaysiaSchool of Materials Engineering, Universiti Malaysia Perlis , 02600 Jejawi, Kangar, Perlis, MalaysiaDepartment of Chemical Engineering, Faculty of Engineering, Chulalongkorn University , Bangkok 10330, ThailandDepartment of Electronics Technology, Budapest University of Technology and Economics , Budapest, HungaryDepartment of Marine Electronics, Gdynia Maritime University , Gdynia, Poland; Łukasiewicz Research Network—Institute of Electron Technology, Kraków Division, Krakow, PolandSchool of Materials and Mineral Resources Engineering, Universiti Sains Malaysia , 14300, Nibong Tebal, Penang, MalaysiaThis work aims to provide deep morphological observation on the incorporated TiO _2 nanoparticles within the SAC305 by selective electrochemical etching. Cyclic voltammetry and chronoamperometry were used to investigate the selective etching performances. The removal of β -Sn matrix was conducted at a fixed potential of −350 mV. Average performances of 2.19 and 2.30 mA were attained from the chronoamperometry. The efficiency of β -Sn removal was approved according to the reduction of the intensities on the phase analysis. Successful observation of the TiO _2 near the Cu _6 Sn _5 layer was attained for an optimum duration of 120 s. Clusters of TiO _2 nanoparticles were entrapped by Cu _6 Sn _5 and Ag _3 Sn intermetallic compound (IMC) layer network and at the solder/substrate interface. The presence of TiO _2 nanoparticles at the solder interface suppresses the growth of the Cu _6 Sn _5 IMC layer. The absence of a β -Sn matrix also allowed in-depth morphological observations to be made of the shape and size of the Cu _6 Sn _5 and Ag _3 Sn. It was found that TiO _2 content facilitates the β -Sn removal, which allows better observation of the IMC phases as well as the TiO _2 reinforcement particles.https://doi.org/10.1088/2053-1591/ab6b57intermetallic compoundsmicrostructureSACreflow solderingTiO2 nanoparticles
spellingShingle Muhamad Zamri Yahaya
Muhammad Firdaus Mohd Nazeri
Soorathep Kheawhom
Balázs Illés
Agata Skwarek
Ahmad Azmin Mohamad
Microstructural analysis of Sn-3.0Ag-0.5Cu-TiO2 composite solder alloy after selective electrochemical etching
Materials Research Express
intermetallic compounds
microstructure
SAC
reflow soldering
TiO2 nanoparticles
title Microstructural analysis of Sn-3.0Ag-0.5Cu-TiO2 composite solder alloy after selective electrochemical etching
title_full Microstructural analysis of Sn-3.0Ag-0.5Cu-TiO2 composite solder alloy after selective electrochemical etching
title_fullStr Microstructural analysis of Sn-3.0Ag-0.5Cu-TiO2 composite solder alloy after selective electrochemical etching
title_full_unstemmed Microstructural analysis of Sn-3.0Ag-0.5Cu-TiO2 composite solder alloy after selective electrochemical etching
title_short Microstructural analysis of Sn-3.0Ag-0.5Cu-TiO2 composite solder alloy after selective electrochemical etching
title_sort microstructural analysis of sn 3 0ag 0 5cu tio2 composite solder alloy after selective electrochemical etching
topic intermetallic compounds
microstructure
SAC
reflow soldering
TiO2 nanoparticles
url https://doi.org/10.1088/2053-1591/ab6b57
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