Quantum-mechanical calculation of carrier distribution in MOS accumulation and strong inversion layers

We derive a statistical physics model of two-dimensional electron gas (2DEG) and propose an accurate approximation method for calculating the quantum-mechanical effects of metal-oxide-semiconductor (MOS) structure in accumulation and strong inversion regions. We use an exponential surface potential...

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Main Authors: Chien-Wei Lee, Jenn-Gwo Hwu
Format: Article
Language:English
Published: AIP Publishing LLC 2013-10-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4826886
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author Chien-Wei Lee
Jenn-Gwo Hwu
author_facet Chien-Wei Lee
Jenn-Gwo Hwu
author_sort Chien-Wei Lee
collection DOAJ
description We derive a statistical physics model of two-dimensional electron gas (2DEG) and propose an accurate approximation method for calculating the quantum-mechanical effects of metal-oxide-semiconductor (MOS) structure in accumulation and strong inversion regions. We use an exponential surface potential approximation in solving the quantization energy levels and derive the function of density of states in 2D to 3D transition region by applying uncertainty principle and Schrödinger equation in k-space. The simulation results show that our approximation method and theory of density of states solve the two major problems of previous researches: the non-negligible error caused by the linear potential approximation and the inconsistency of density of states and carrier distribution in 2D to 3D transition region.
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spelling doaj.art-6511df3e5d8d4ae59ebfbbe3531b328e2022-12-22T01:28:59ZengAIP Publishing LLCAIP Advances2158-32262013-10-01310102123102123-1810.1063/1.4826886026310ADVQuantum-mechanical calculation of carrier distribution in MOS accumulation and strong inversion layersChien-Wei Lee0Jenn-Gwo Hwu1Graduate Institute of Electronics Engineering/ Department of Electrical Engineering, National Taiwan University, Taipei, 10617, TaiwanGraduate Institute of Electronics Engineering/ Department of Electrical Engineering, National Taiwan University, Taipei, 10617, TaiwanWe derive a statistical physics model of two-dimensional electron gas (2DEG) and propose an accurate approximation method for calculating the quantum-mechanical effects of metal-oxide-semiconductor (MOS) structure in accumulation and strong inversion regions. We use an exponential surface potential approximation in solving the quantization energy levels and derive the function of density of states in 2D to 3D transition region by applying uncertainty principle and Schrödinger equation in k-space. The simulation results show that our approximation method and theory of density of states solve the two major problems of previous researches: the non-negligible error caused by the linear potential approximation and the inconsistency of density of states and carrier distribution in 2D to 3D transition region.http://dx.doi.org/10.1063/1.4826886
spellingShingle Chien-Wei Lee
Jenn-Gwo Hwu
Quantum-mechanical calculation of carrier distribution in MOS accumulation and strong inversion layers
AIP Advances
title Quantum-mechanical calculation of carrier distribution in MOS accumulation and strong inversion layers
title_full Quantum-mechanical calculation of carrier distribution in MOS accumulation and strong inversion layers
title_fullStr Quantum-mechanical calculation of carrier distribution in MOS accumulation and strong inversion layers
title_full_unstemmed Quantum-mechanical calculation of carrier distribution in MOS accumulation and strong inversion layers
title_short Quantum-mechanical calculation of carrier distribution in MOS accumulation and strong inversion layers
title_sort quantum mechanical calculation of carrier distribution in mos accumulation and strong inversion layers
url http://dx.doi.org/10.1063/1.4826886
work_keys_str_mv AT chienweilee quantummechanicalcalculationofcarrierdistributioninmosaccumulationandstronginversionlayers
AT jenngwohwu quantummechanicalcalculationofcarrierdistributioninmosaccumulationandstronginversionlayers