TiAlN films on ASTM A36 steel for sputtering reactive process RF
TiAlN films were deposited on ASTM A36 steel by RF reactive sputtering process using a TiAl (60/40%) target. Films were sputtered at two different relative pressures, 0,05 and 0,1, keeping constant the Argon pressure. The films were deposited on samples with different pretreatments: as received mat...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
Universidad de Antioquia
2006-08-01
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| Series: | Revista Facultad de Ingeniería Universidad de Antioquia |
| Subjects: | |
| Online Access: | https://revistas.udea.edu.co/index.php/ingenieria/article/view/343445 |