Optically Active Defect Engineering via Plasma Treatment in a MIS‐Type 2D Heterostructure

Optically Active Defect Engineering via Plasma Treatment in a MIS‐Type 2D Heterostructure

Abstract At the interface of 2D heterostructures, the presence of defects and their manipulation play a crucial role in the interfacial charge transfer behavior, further influencing the device functionality and performance. In this study, the impact of deliberately introduced photo‐active defects in...

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Bibliographic Details
Main Authors: Yingjie Tao, Ran Tian, Jiayuan Zhou, Kui Chu, Xuegang Chen, Wenshuai Gao, Guopeng Wang, Yuxuan Jiang, Kenji Watanabe, Takashi Taniguchi, Mingliang Tian, Xue Liu
Format: Article
Language:English
Published: Wiley-VCH 2024-10-01
Series:Advanced Materials Interfaces
Subjects:
defect engineering
ICP treatment
MIS‐type vdW heterostructure
photodetector
Online Access:https://doi.org/10.1002/admi.202400288

Internet

https://doi.org/10.1002/admi.202400288

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